Integrated Circuit Technology: A Complete Guide to IC Fabrication

Integrated Circuit Technology: A Complete Guide to IC Fabrication

By Poonam Sonawane (2025)

This comprehensive treatise delivers a rigorous examination of semiconductor manufacturing from substrate engineering to 3nm node integration. Authored by industry authority Poonam Sonawane, the work systematically addresses the physical and economic challenges of post-Moore scaling, including gate-all-around nanosheet architectures, backside power delivery networks, and atomic-layer precision processes.

Key technical coverage includes:

• Device Physics: Electrostatic control methodologies for FinFETs and GAA transistors, quantum confinement effects at sub-5nm dimensions, and carrier transport in strained-silicon/Ge channels.

• Material Innovations: Epitaxial growth of Si/SiGe heterostructures, high-k/metal gate stacks for leakage mitigation, and 2D material integration (MoS₂, WSe₂) for beyond-silicon devices.

• Process Technologies: EUV lithography resolution enhancement techniques, plasma-assisted atomic layer etching (ALE), millisecond laser annealing for ultra-shallow junctions, and cobalt/ruthenium interconnect solutions for RC delay reduction.

• Yield Optimization: Statistical process control for sub-nm CD variation, machine learning-driven defect detection, and contamination management in advanced cleanrooms.

The text further explores emerging paradigms: quantum device fabrication, neuromorphic hardware, and heterogeneous 3D integration schemes. Supported by 300+ illustrations, process flow diagrams, and chapter-end problems with industrial relevance, this reference equips process engineers, device physicists, and graduate students with actionable knowledge for semiconductor R&D and manufacturing.